Virtual Interface Technology for 3D-IC Metrology: TSV profile (depth, top & bottom CD) , Remaining Silicon Thickness (RST), Copper Nail Height, Bump Height and Cu pillar Height, Edge trim profile.
Dimensional metrology system for 3D-IC application: Through Silicon Via (TSV) depth, top CD, bottom CD, remaining silicon thickness (RST), copper pillar height, bump height, and many more. Fully automated cassette to cassette system for 300mm wafers. SECS/GEM option. Warp, Roughness, and Thin Film Thickness measurement options.
FSM will be presenting and demonstrating Non-Contact Stress Metrology for Flexible Electronics at the 2018 FLEX Conference in Monterey CA, Feb. 12-15, 2018.Feb 12, 2018
FSM will be presenting at the ASMC 2018 in Saratoga Springs, NY.Apr 30, 2018
FSM will be presenting at the International Conference on Metallurgical Coatings and Thin Films (ICMCTF) in San Diego, CA.Apr 23, 2018